The Hatch Training Intensive is specifically targeted towards readying artists to work in community-centric art projects in ways that are both sustainable and meaningful to all involved stakeholders. Twelve artists will be chosen for this program through a competitive application process (see details at right). Arts workers of all disciplines and mediums will be considered, including those working in all visual and performing arts, music, dance, film or as arts administrators. Some outside and group work (about 6 hours total monthly) is expected for successful completion of this program.
DEADLINE: Applications for the Spring 2017 Hatch are due Monday, January 9, 2017 at 11:59 PM. No late applications will be accepted.
Artists will learn:
- Methods of organizing community around social impact through arts and culture emphasizing available assets over deficits
- Tools and activities to engage dialogue, break down barriers, and create a shared language among key stakeholders
- The history and processes of city planning, and the ways in which arts and culture can be incorporated into urban development
- How to negotiate, read/build contracts, and build robust budgets that both account for all aspects of project expense, including artist fee, and reflect the story of your project to funders and stakeholders
The Hatch program costs approximately $6,000 per participant to produce. C4 Atlanta is subsiding the cost of the program to artists by 94% for a total cost to participating artists of $360. Payment options are available for those who are accepted.
Hatch is generously funded by the Emily Hall Tremaine Foundation.
Read our pilot Hatch artists’ posts on the C4 Atlanta blog to learn more about class sessions, curriculum, and firsthand experience from your peers.
See the Fall 2016 Class present their final presentations!
Date/Time: December 4, 2016 – 4:00pm – 6:00pm
Location: Fuse Arts Center
Applications for the Fall 2016 Hatch Training Intensive are now closed. Please check back later for Spring 2017 Hatch Training Intensive applications.